Plasma-enhanced chemical-vapor deposition oxide prepared at low-flow conditions for course wavelength-division multiplexing optical-waveguide devices

Chu, A. K.A. K.ChuLin, J. Y.J. Y.LinWang, M. L.M. L.WangFan, C. C.C. C.FanShue, H. S.H. S.ShueChuang, T. H.T. H.ChuangChen, S. Y.S. Y.ChenChiu, C. H.C. H.ChiuLin, S. F.S. F.LinTUNG-HAN CHUANG2020-05-122020-05-1220030361-5235https://scholars.lib.ntu.edu.tw/handle/123456789/492094Plasma-enhanced chemical-vapor deposition oxide prepared at low-flow conditions for course wavelength-division multiplexing optical-waveguide devicesjournal article10.1007/s11664-003-0131-1WOS:000183490500004