Reliable fluorinated thin gate oxides prepared by liquid phase deposition following rapid thermal process

Lu, W.-S.W.-S.LuHwu, J.-G.J.-G.HwuJENN-GWO HWU2018-09-102018-09-101996http://www.scopus.com/inward/record.url?eid=2-s2.0-0030130022&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/321877[SDGs]SDG6Reliable fluorinated thin gate oxides prepared by liquid phase deposition following rapid thermal processjournal article10.1109/55.485164