Yu, Y.-T.Y.-T.YuChan, Y.-C.Y.-C.ChanSinha, S.S.SinhaJiang, I.H.-R.I.H.-R.JiangChiang, C.C.ChiangHUI-RU JIANG2020-06-112020-06-112012https://scholars.lib.ntu.edu.tw/handle/123456789/497940In advanced fabrication technology, the sub-wavelength lithography gap causes unwanted layout distortions. Even if a layout passes design rule checking (DRC), it still might contain process hotspots, which are sensitive to the lithographic process. Hence, process-hotspot detection has become a crucial issue. In this paper, we propose an accurate process-hotspot detection framework. Unlike existing DRC-based works, we extract only critical design rules to express the topological features of hotspot patterns. We adopt a two-stage filtering process to locate all hotspots accurately and efficiently. Compared with state-of-the-art DRC-based works, our results show that our approach can reach 100% success rate with significant speedups. © 2012 ACM.[SDGs]SDG9conference paper10.1145/2228360.22285762-s2.0-84863537071https://www.scopus.com/inward/record.uri?eid=2-s2.0-84863537071&doi=10.1145%2f2228360.2228576&partnerID=40&md5=33360db1a47529c81b45dbbb02feaaaa