Structural and electrical characteristics of atomic layer deposited high kappa HfO2 on GaN

Chang, YCYCChangChiu, HCHCChiuLee, YJYJLeeHuang, MLMLHuangLee, KYKYLeeMINGHWEI HONGChiu, YNYNChiuKwo, JJKwoWang, Yeong-HerYeong-HerWangothers2018-09-102018-09-102007http://scholars.lib.ntu.edu.tw/handle/123456789/331415Structural and electrical characteristics of atomic layer deposited high kappa HfO2 on GaNjournal article