Properties and Chemical-Mechanical Polishing Characteristics of Low Dielectric Constant Polymer Films:PAE-2 and Flare 2.0

WEN-CHANG CHENCheng Tyng YenBau-Tong DaiMing-Shih Tsai2018-09-102018-09-102000http://www.scopus.com/inward/record.url?eid=2-s2.0-0034190292&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/289055Properties and Chemical-Mechanical Polishing Characteristics of Low Dielectric Constant Polymer Films:PAE-2 and Flare 2.0journal article10.6967/JCICE.200005.02532-s2.0-0034190292WOS:000088080500007