In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: Electronic and electric structures

Pi, T.W.T.W.PiLin, Y.H.Y.H.LinFanchiang, Y.T.Y.T.FanchiangChiang, T.H.T.H.ChiangWei, C.H.C.H.WeiLin, Y.C.Y.C.LinWertheim, G.K.G.K.WertheimKwo, J.J.KwoMINGHWEI HONG2019-12-272019-12-272015https://scholars.lib.ntu.edu.tw/handle/123456789/443323In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: Electronic and electric structuresjournal article10.1088/0957-4484/26/16/1640012-s2.0-84961289164https://www.scopus.com/inward/record.uri?eid=2-s2.0-84961289164&doi=10.1088%2f0957-4484%2f26%2f16%2f164001&partnerID=40&md5=aaf24cca9f60a7907a09c0ba1ca5bd0f