Chen, Hsuen-LiHsuen-LiChenFan, WonderWonderFanWang, Tzyy-JyannTzyy-JyannWangKo, Fu-HsiungFu-HsiungKoZhai, Run-ShengRun-ShengZhaiHsu, Chien-KuiChien-KuiHsuChuang, Tung-JungTung-JungChuang2008-12-312018-06-282008-12-312018-06-2820041559128Xhttp://ntur.lib.ntu.edu.tw//handle/246246/95613https://www.scopus.com/inward/record.uri?eid=2-s2.0-1942519182&doi=10.1364%2fAO.43.002141&partnerID=40&md5=14c743912e047713a445e06c67d8543aWe demonstrate an optical-gradient bottom antireflective coating (BARC) film, which can be easily prepared by treating a silicon nitride film with oxygen plasma. The oxygen composition is gradually decreased inside the silicon nitride film. The optical constants of the silicon nitride film are also changed gradually. A reflectance of less than 1% for various highly reflective substrates with high thickness-controlled tolerance has been achieved. The optical-gradient film is also shown to have high thermal stability during the postexposure bake procedure. Results indicate that the optical-gradient-type BARC is suitable in both ArF and F2 excimer lasers for sub-70-nm lithography applications. © 2004 Optical Society of America.application/pdf200639 bytesapplication/pdfen-USExcimer lasers; Optical coatings; Optical films; Oxygen; Photolithography; Plasmas; Reflection; Silicon nitride; Thermodynamic stability; Thin films; Optical constants; Optical gradient antireflective coatings; Silicon nitride film; Antireflection coatingsjournal article10.1364/AO.43.0021412-s2.0-1942519182http://ntur.lib.ntu.edu.tw/bitstream/246246/95613/1/13.pdf