Band offsets and charge storage characteristics of atomic layer deposited high- k Hf O<inf>2</inf> Ti O<inf>2</inf> multilayers

Maikap, S.S.MaikapWang, T.-Y.T.-Y.WangTzeng, P.-J.P.-J.TzengLin, C.-H.C.-H.LinTien, T.C.T.C.TienLee, L.S.L.S.LeeYang, J.-R.J.-R.YangTsai, M.-J.M.-J.TsaiJER-REN YANG2020-05-122020-05-122007https://scholars.lib.ntu.edu.tw/handle/123456789/491629Band offsets and charge storage characteristics of atomic layer deposited high- k Hf O<inf>2</inf> Ti O<inf>2</inf> multilayersjournal article10.1063/1.27515792-s2.0-34547296613https://www.scopus.com/inward/record.uri?eid=2-s2.0-34547296613&doi=10.1063%2f1.2751579&partnerID=40&md5=8d65213fcd662eac8223b1550f32d4a2