Nanopatterning with 248 nm photolithography by photostabilizing bilayer photoresists

Tsai, F.-Y.F.-Y.TsaiJhuo, S.-J.S.-J.JhuoLee, J.-T.J.-T.LeeTsaiFY2008-12-312018-06-282008-12-312018-06-282007http://ntur.lib.ntu.edu.tw//handle/246246/95643application/pdf363821 bytesapplication/pdfen-USNanopatterning with 248 nm photolithography by photostabilizing bilayer photoresistsjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/95643/1/03.pdf