Etching of ruthenium coatings in O <inf>2</inf>- and Cl <inf>2</inf>- containing plasmas

Hsu, C.C.C.C.HsuCoburn, J.W.J.W.CoburnGraves, D.B.D.B.GravesJERRY CHENG-CHE HSU2020-01-062020-01-062006https://scholars.lib.ntu.edu.tw/handle/123456789/445423Etching of ruthenium coatings in O <inf>2</inf>- and Cl <inf>2</inf>- containing plasmasjournal article10.1116/1.21217512-s2.0-84858519805https://www.scopus.com/inward/record.uri?eid=2-s2.0-84858519805&doi=10.1116%2f1.2121751&partnerID=40&md5=d9dee273e96959f10dc1d4307cee4d76