楊照彥臺灣大學：應用力學研究所莊宇軒Chuang, Yu-HsuanYu-HsuanChuang2007-11-292018-06-292007-11-292018-06-292007http://ntur.lib.ntu.edu.tw//handle/246246/62584靜電吸盤（Electrostatic Chuck,ESC）已經廣泛的被半導體界所使用，而現在更應用到其他的業界中，例如應用在面版廠中可拿來固定ITO導電玻璃。此零組件之應用範圍日漸增加。在早期，靜電吸盤只用於吸附晶圓這方面，但是靜電吸盤還有能力可以去吸附其他類別的材料，所以根據觀察，靜電吸盤的應用範圍應該會越來越廣。本論文即是再討論各種不同介電性質之材料對於靜電吸盤吸附力之影響。本實驗利用靜電吸盤之測試平台，針對五種不同介電性質之材料做靜電吸盤之吸附力測試，由實驗結果中發現，靜電吸盤對於不同材料之吸附力會因其介電常數之不同而不同，其吸附力大小與吸附材料之介電常數呈現一正比的關係。經由理論中解釋會發生此現象的原因是因為影響靜電吸盤吸附力中的一項參數ε(介電常數,Dielectric constant)會因吸附物之介電常數不同而改變，原本之ε值會因為靜電吸盤與材料並聯而改變，進而影響吸附力之大小，此現象之推測在本論文中有詳細之解釋。The Electrostatic Chuck (ESC) has been widely used in semiconductor industries, and now is being increasingly applied by other industries, for example, Flat Panel Display (FPD) industry, to hold ITO glasses. Previously, ESC was used only for silicon wafer. Based on our observations, however, the application of ESC might increase to a broader range because of its ability to chuck other materials as well. In this thesis, we discuss the effect of the chucking force on dielectric constants between different materials. We designed a chucking force experiment to test five different materials on an ESC test platform. We found different chucking forces of ESC due to variations in dielectric constant of the material and the chucking force was directly proportional to dielectric constant. We observed that one of the parameters of the chucking force could change with changing chucking material. As a result, original value of dielectric constant will change because ESC becomes multiple to the chucked material. A detailed explanation of this phenomenon has been provided in the thesis.目錄 致謝..................................................I 摘要.................................................II 英文摘要............................................III 目錄.................................................IV 圖表目次.............................................VI 第一章 緒論 1.1 前言......................................1 1.2 研究動機..................................1 1.3 文獻回顧..................................2 第二章 傳統式晶圓座與ESC簡介.........................4 2.1 傳統式晶圓座簡介...........................4 2.1.1 力學式晶圓座.........................4 2.1.2 真空式晶圓座.........................6 2.2 靜電式晶圓座(ESC)之簡介與應用.............6 2.2.1 靜電式晶圓座之簡介.................8 2.2.2 靜電式晶圓座應用...................8 第三章 Electrostatic Chuck工作原理...................15 3.1 ESC工作原理.............................15 3.2單極 ESC................................21 3.3雙極 ESC................................23 第四章 實驗架構......................................25 4.1 量測方式與概念............................25 4.2 實驗儀器架設..............................26 4.3 實驗流程..................................32 第五章 實驗結果與討論................................39 5.1 實驗設定.................................39 5.1.1 材料尺寸設定.......................39 5.1.2 實驗環境設定......................42 5.2 實驗結果.................................43 5.3 討論.....................................50 第六章 未來工作與展望................................53 參考文獻.............................................543083158 bytesapplication/pdfen-US靜電吸盤介電材料介電常數吸附力氦氣測漏率Electrostatic ChuckDielectric materialsDielectric ConstantChucking ForceHe Leakage Ratethesishttp://ntur.lib.ntu.edu.tw/bitstream/246246/62584/1/ntu-96-R93543041-1.pdf