Novel bilayer bottom antireflective coating structure for high-performance ArF lithography applications

Chen, H.L.H.L.ChenChao, W.C.W.C.ChaoKo, F.H.F.H.KoChu, T.C.T.C.ChuHuang, T.Y.T.Y.HuangHSUEN-LI CHEN2020-05-122020-05-122002https://scholars.lib.ntu.edu.tw/handle/123456789/491377Novel bilayer bottom antireflective coating structure for high-performance ArF lithography applicationsjournal article10.1117/1.14479472-s2.0-0005306540https://www.scopus.com/inward/record.uri?eid=2-s2.0-0005306540&doi=10.1117%2f1.1447947&partnerID=40&md5=742c26c354d5373a16785dcfedec77ca