Chein, Wei HsinWei HsinCheinYang, Fu ShengFu ShengYangFu, Zi YingZi YingFuLIANG-CHIA CHEN2023-10-252023-10-252023-01-0197815106644700277786Xhttps://scholars.lib.ntu.edu.tw/handle/123456789/636530A new non-integral optical scatterometry technique has been introduced to circumvent issues with traditional methods in the critical dimension (CD) characterization of micro and nano-structures in semiconductor inspections. This method uses the high spatial coherence of the laser source, and an adjustable numerical aperture (NA) for effective beam shaping, enabling precise measurement of high-aspect-ratio structures. It incorporates a model-based approach with a virtual optical system and the Finite-Difference Time-Domain (FDTD) method for multiple CD characterizations, improving measurement precision. Early tests indicate a minimal average bias of 1.74% from calibrated references and standard deviations within 7 nm.conference paper10.1117/12.26733182-s2.0-85173019562https://api.elsevier.com/content/abstract/scopus_id/85173019562