New CVD source reagents for osmium thin film deposition

Yu, H.-L.H.-L.YuChi, Y.Y.ChiLiu, C.-S.C.-S.LiuSHIE-MING PENGLee, G.-H.G.-H.Lee2018-09-102018-09-102001http://www.scopus.com/inward/record.url?eid=2-s2.0-0001503617&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/292807New CVD source reagents for osmium thin film depositionjournal article10.1002/1521-3862(200111)7:6<2452-s2.0-37649026043WOS:000172178700003