HSUEN-LI CHENLON A. WANG2018-09-102018-09-101999-08https://www.scopus.com/inward/record.uri?eid=2-s2.0-0032606739&doi=10.1364%2fAO.38.004885&partnerID=40&md5=440bd951abc8d9965a7e790cdd76917cWe demonstrate a new bottom antireflective coating (BARC) layer for ArF excimer laser lithography. The antireflective layer is composed of hexamethyldisiloxane (HMDSO) film, which is deposited by the conventional electron cyclotron resonance-plasma-enhanced chemical-vapor deposition process. We obtain the appropriate HMDSO films for BARC layers by varying the gas-flow rate ratio of oxygen to HMDSO. Such a process has several advantages: high deposition rate, low process temperature, easy film removal, and reduced cost. Measured reflectances of less than 0.5% on both Al-Si and silicon crystal substrates have been achieved and agree well with the simulated reflectances. The swing effect is shown to be significantly reduced by addition of the HMDSO-based BARC layer. © 1999 Optical Society of America.Electron cyclotron resonance; Excimer lasers; Light extinction; Light transmission; Photolithography; Plasma enhanced chemical vapor deposition; Refractive index; Silicon compounds; Bottom antireflective coatings (BARC); Hexamethyldisiloxane; Antireflection coatingsjournal article10.1364/AO.38.0048852-s2.0-0032606739WOS:000081902000019