Low dielectric constant SILK films as bottom antireflective coating layers for both KrF and ArF lithography

Chen, H.L.H.L.ChenKo, F.H.F.H.KoChu, T.C.T.C.ChuCheng, H.C.H.C.ChengHuang, T.Y.T.Y.HuangHSUEN-LI CHEN2020-05-122020-05-122001https://scholars.lib.ntu.edu.tw/handle/123456789/491399Low dielectric constant SILK films as bottom antireflective coating layers for both KrF and ArF lithographyconference paper10.1109/IMNC.2001.9841242-s2.0-84960373085https://www.scopus.com/inward/record.uri?eid=2-s2.0-84960373085&doi=10.1109%2fIMNC.2001.984124&partnerID=40&md5=9c0b3222235fd0dcba4e8006cf53da48