Enhance Extreme UltraViolet Lithography mask inspection contrast by using Fabry-Perot type antireflective coatings

Cheng, H.C.H.C.ChengChen, H.L.H.L.ChenKo, T.S.T.S.KoLai, L.J.L.J.LaiKo, F.H.F.H.KoChu, T.C.T.C.ChuHSUEN-LI CHEN2020-05-122020-05-122003https://scholars.lib.ntu.edu.tw/handle/123456789/491372Enhance Extreme UltraViolet Lithography mask inspection contrast by using Fabry-Perot type antireflective coatingsconference paper10.1109/IMNC.2003.12685352-s2.0-84949226348https://www.scopus.com/inward/record.uri?eid=2-s2.0-84949226348&doi=10.1109%2fIMNC.2003.1268535&partnerID=40&md5=682b5c770999a42bb7f333a65aec50dd