Crystallization Behavior of R.F.-Sputtered Near Stoichiometric Ni2MnGa Thin Films

Wu, S.K.S.K.WuTseng, K.H.K.H.TsengWang, J.Y.J.Y.WangWuSK2008-11-192018-06-282008-11-192018-06-282002http://ntur.lib.ntu.edu.tw//handle/246246/86869application/pdf428548 bytesapplication/pdfen-USCrystallization Behavior of R.F.-Sputtered Near Stoichiometric Ni2MnGa Thin Filmsjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/86869/1/97.pdf