Thermal stability of amorphous-like WNx/W bilayered diffusion barrier for chemical vapor deposited-tungsten/p(+)-Si contact system

Chang, K. M.K. M.ChangDeng, I. C.I. C.DengYeh, T. H.T. H.YehLain, K. D.K. D.LainCHAO-MING FU2019-12-192019-12-1919990021-4922https://scholars.lib.ntu.edu.tw/handle/123456789/436215Thermal stability of amorphous-like WNx/W bilayered diffusion barrier for chemical vapor deposited-tungsten/p(+)-Si contact systemjournal article10.1143/JJAP.38.1343WOS:000079759000012