Improved Si0.5Ge0.5/Si interface quality achieved by the process of low energy hydrogen plasma cleaning and investigation of interface quality with positron annihilation spectroscopy

M. H.LiaoC.-H. Chen2019-03-112019-03-112013https://scholars.lib.ntu.edu.tw/handle/123456789/404528Improved Si0.5Ge0.5/Si interface quality achieved by the process of low energy hydrogen plasma cleaning and investigation of interface quality with positron annihilation spectroscopyjournal article