Effect of Dilution Gas on SiCN Films Growth Using Methylamine

J.-J. WuK. H. ChenC. Y. WenL. C. ChenY. C. YuC. W. WangE. K. Lin2020-06-202020-06-20200102540584https://scholars.lib.ntu.edu.tw/handle/123456789/503913Effect of Dilution Gas on SiCN Films Growth Using Methylaminejournal articlehttps://doi.org/10.1016/S0254-0584(01)00445-X