Fast lithographic mask optimization considering process variation

Su, Y.-H.Y.-H.SuHuang, Y.-C.Y.-C.HuangTsai, L.-C.L.-C.TsaiChang, Y.-W.Y.-W.ChangBanerjee, S.S.BanerjeeYAO-WEN CHANG2018-09-102018-09-102015http://www.scopus.com/inward/record.url?eid=2-s2.0-84936869631&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/393139Fast lithographic mask optimization considering process variationconference paper10.1109/ICCAD.2014.70013572-s2.0-84936869631