Nucleation engineering for atomic layer deposition of uniform sub-10 nm high-K dielectrics on MoTe<inf>2</inf>

Lin, Y.-S.Y.-S.LinKwak, I.I.KwakChung, T.-F.T.-F.ChungYang, J.-R.J.-R.YangKummel, A.C.A.C.KummelMIIN-JANG CHEN2020-05-122020-05-122019https://scholars.lib.ntu.edu.tw/handle/123456789/491490[SDGs]SDG6Nucleation engineering for atomic layer deposition of uniform sub-10 nm high-K dielectrics on MoTe<inf>2</inf>journal article10.1016/j.apsusc.2019.06.1922-s2.0-85067891764https://www.scopus.com/inward/record.uri?eid=2-s2.0-85067891764&doi=10.1016%2fj.apsusc.2019.06.192&partnerID=40&md5=79c1f229ff916efd8921a72e17e6bb82