Chen L.C.Spaepen F.Robertson J.L.Moss S.C.Hiraga K.LI-CHYONG CHEN2022-08-092022-08-09199008842914https://www.scopus.com/inward/record.uri?eid=2-s2.0-0025494448&doi=10.1557%2fJMR.1990.1871&partnerID=40&md5=2b5a597fe74b8f6d995fea1bb3b0a56bhttps://scholars.lib.ntu.edu.tw/handle/123456789/616476Scanning and isothermal calorimetry, together with x-ray diffraction and high resolution transmission electron microscopy (TEM), have been used to characterize Al-Mn and Al-Mn-Si films sputtered onto substrates at 60 °C, 45 °C, and −100 °C. In the case of Al0.83Mn0.17; the monotonically decreasing isothermal calorimetric signal, characteristic of a grain growth process, has proved decisive in identifying the as-sputtered “amorphous” state as microquasicrystalline, with an average grain size of ∼20 Å, in agreement with an estimate of correlation range from the x-ray pattern. The TEM at 400 keV reveals well-defined atomic or lattice images in annealed films but only barely resolved grains (ordered clusters) in the as-sputtered films. The relation between the metallic glass and the microquasicrystalline state in these alloys is discussed. © 1990, Materials Research Society. All rights reserved.Aluminum Manganese Silicon Alloys - Crystallization;Aluminum Metallography - Transformations;Calorimetry;Films - X-Ray Analysis;Glass, Metallic - Sputtering;Film Sputtering;Isothermal Calorimetry;Microquasicrystalline State;Aluminum Manganese Alloysjournal article10.1557/JMR.1990.18712-s2.0-0025494448