Measurement and modeling of time- and spatial-resolved wafer surface temperature in inductively coupled plasmas

Hsu, C. C.C. C.HsuTitus, M. J.M. J.TitusGraves, D. B.D. B.GravesJERRY CHENG-CHE HSU2020-01-062020-01-0620070734-2101https://scholars.lib.ntu.edu.tw/handle/123456789/445433Measurement and modeling of time- and spatial-resolved wafer surface temperature in inductively coupled plasmasjournal article10.1116/1.2731369WOS:000246746100032