Native-conflict and stitch-aware wire perturbation for double patterning technology

Fang, S.-Y.S.-Y.FangChen, S.-Y.S.-Y.ChenYAO-WEN CHANG2018-09-102018-09-102012http://www.scopus.com/inward/record.url?eid=2-s2.0-84860272222&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/372705[SDGs]SDG9[SDGs]SDG16Native-conflict and stitch-aware wire perturbation for double patterning technologyjournal article10.1109/TCAD.2011.21790392-s2.0-84860272222WOS:000303205900005