Quality improvement of ultrathin gate oxide by using thermal growth followed by SF ANO technique

JENN-GWO HWU2018-09-102018-09-102004http://www.scopus.com/inward/record.url?eid=2-s2.0-5044240747&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/307543Quality improvement of ultrathin gate oxide by using thermal growth followed by SF ANO techniquejournal article10.1109/LED.2004.836031