SiNx barrier layers deposited at 250°C on a clear polymer substrate

Cherenack, K.K.CherenackKattamis, A.A.KattamisLong, K.K.LongCheng, I.-C.I.-C.ChengWagner, S.S.WagnerSturm, J.C.J.C.SturmI-CHUN CHENG2018-09-102018-09-102006http://www.scopus.com/inward/record.url?eid=2-s2.0-33947659598&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/323881SiNx barrier layers deposited at 250°C on a clear polymer substrateconference paper