Chang, Y.C.Y.C.ChangChiu, H.C.H.C.ChiuLee, Y.J.Y.J.LeeHuang, M.L.M.L.HuangLee, K.Y.K.Y.LeeMINGHWEI HONGChiu, Y.N.Y.N.ChiuKwo, J.J.KwoWang, Y.H.Y.H.Wang2019-12-272019-12-272007https://scholars.lib.ntu.edu.tw/handle/123456789/443437Structural and electrical characteristics of atomic layer deposited high εΊ₯ HfO<inf>2</inf>on GaNjournal article10.1063/1.27460572-s2.0-34250703717https://www.scopus.com/inward/record.uri?eid=2-s2.0-34250703717&doi=10.1063%2f1.2746057&partnerID=40&md5=7dd9a84404ef3b7011f73a5e887c7943