Methods of Forming An Interconnect Structure Using A Self-Ending Anodic Oxidation

Jenn-Gwo HwuWei-Cheng TianSamuel C. PanChao-Hsiung WangChi-Wen LiuJENN-GWO HWU2019-10-312019-10-312017https://scholars.lib.ntu.edu.tw/handle/123456789/429175Methods of Forming An Interconnect Structure Using A Self-Ending Anodic OxidationpatentU.S.A. Patent, Patent No.: US 9,812,395 B2