Metal gate/High-K dielectric stack on Si cap/ultra-thin pure Ge epi/Si substrate

Yeo, C.C.C.C.YeoLee, M.H.M.H.LeeLiu, C.W.C.W.LiuChoi, K.J.K.J.ChoiLee, T.W.T.W.LeeCho, B.J.B.J.ChoCHEE-WEE LIU2020-06-162020-06-162006https://scholars.lib.ntu.edu.tw/handle/123456789/502109Metal gate/High-K dielectric stack on Si cap/ultra-thin pure Ge epi/Si substrateconference paper10.1109/EDSSC.2005.16352172-s2.0-43549119975https://www.scopus.com/inward/record.uri?eid=2-s2.0-43549119975&doi=10.1109%2fEDSSC.2005.1635217&partnerID=40&md5=e8c98e84cb5f397f9f2bca0f2112bbad