Effect of strain-temperature stress on MOS structure with ultra-thin gate oxide

Lin, C.-N.C.-N.LinYang, Y.-L.Y.-L.YangChen, W.-T.W.-T.ChenLin, S.-C.S.-C.LinChuang, K.-C.K.-C.ChuangJENN-GWO HWU2018-09-102018-09-102008https://www.scopus.com/inward/record.uri?eid=2-s2.0-49549116191&doi=10.1016%2fj.mee.2008.06.010&partnerID=40&md5=50fed07956d52ff9930b73a4af4f8ca7http://scholars.lib.ntu.edu.tw/handle/123456789/338630Effect of strain-temperature stress on MOS structure with ultra-thin gate oxidejournal article10.1016/j.mee.2008.06.0102-s2.0-49549116191