Hwu, Jenn-GwoJenn-GwoHwuJeng, Ming-JerMing-JerJengJENN-GWO HWU2018-09-102018-09-101988http://www.scopus.com/inward/record.url?eid=2-s2.0-0024106111&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/338638C-V hysteresis instability in aluminum/tantalum oxide/silicon oxide/silicon capacitors due to postmetallization annealing and Co-60 irradiationjournal article10.1149/1.2095437