Ferroelectric HfZrOx FETs on SOI Substrate with Reverse-DIBL (Drain-Induced Barrier Lowering) and NDR (Negative Differential Resistance)

K.-T. ChenMING-HAN LIAO2021-12-302021-12-302018https://scholars.lib.ntu.edu.tw/handle/123456789/590725Ferroelectric HfZrOx FETs on SOI Substrate with Reverse-DIBL (Drain-Induced Barrier Lowering) and NDR (Negative Differential Resistance)journal article