Thermal stability of Si/Si1-x-yGexCy/Si quantum wells grown by rapid thermal chemical vapor deposition

Liu, C.W.C.W.LiuTseng, Y.D.Y.D.TsengChern, M.Y.M.Y.ChernChang, C.L.C.L.ChangMING-YAU CHERNCHEE-WEE LIU2018-09-102018-09-101999http://www.scopus.com/inward/record.url?eid=2-s2.0-0001458853&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/347689Thermal stability of Si/Si1-x-yGexCy/Si quantum wells grown by rapid thermal chemical vapor depositionjournal article10.1063/1.3695132-s2.0-0001458853WOS:000078403000018