Wu C.-Y.Sun H.-Y.Liang W.-C.Hsu H.-L.Ho H.-Y.Chen Y.-M.Chen H.-Y.2019-05-222019-05-22201613597345https://scholars.lib.ntu.edu.tw/handle/123456789/409847The bottom-up patterning approach provides intrinsic advantages associated with unlimited resolution but is limited by the materials available for selection. A general and simple approach towards the selective deposition of poly-para-xylylenes is introduced in this communication. The chemical vapour deposition (CVD) of poly-para-xylylenes is inhibited on the high-energy surfaces of electrically charged conducting substrates. This technology provides an approach to selectively deposit poly-para-xylylenes irrespective of the substituted functionality and to pattern these polymer thin films from the bottom up. ? The Royal Society of Chemistry 2016.journal article10.1039/c5cc08059b2-s2.0-84959316885https://www.scopus.com/inward/record.uri?eid=2-s2.0-84959316885&doi=10.1039%2fc5cc08059b&partnerID=40&md5=52f74ca3fbfadcd44d0e5ce7dc6b24e6