Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography

Lin, C. H.C. H.LinWang, L. A.L. A.Wang2009-03-252018-07-062009-03-252018-07-062001http://ntur.lib.ntu.edu.tw//handle/246246/148183application/pdf127305 bytesapplication/pdfen-USFeasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithographyjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/148183/1/38.pdf