Construction of a high frequency and high reflectance shutter for a direct write EUV lithography system

Chuang, J.-Y.J.-Y.ChuangYen, J.-Y.J.-Y.YenJuang, B.-Y.B.-Y.JuangWeng, W.-P.W.-P.WengLin, M.-H.M.-H.LinJIA-YUSH YEN2018-09-102018-09-102013http://www.scopus.com/inward/record.url?eid=2-s2.0-84902509825&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/377703[SDGs]SDG7Construction of a high frequency and high reflectance shutter for a direct write EUV lithography systemjournal article10.5875/ausmt.v3i2.1892-s2.0-84902509825