Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists

Kuo, C.I.C.I.KuoChen, H.L.H.L.ChenChu, Y.H.Y.H.ChuLiu, F.K.F.K.LiuKo, F.H.F.H.KoChu, T.C.T.C.ChuHSUEN-LI CHEN2020-05-122020-05-122003https://scholars.lib.ntu.edu.tw/handle/123456789/491374Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resistsconference paper10.1109/IMNC.2003.12687242-s2.0-84949193271https://www.scopus.com/inward/record.uri?eid=2-s2.0-84949193271&doi=10.1109%2fIMNC.2003.1268724&partnerID=40&md5=6754f34bf9727a200e6c75492d713ab4