Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithography

CHIEH-HSIUNG KUANYUNG-YAW CHENKUEN-YU TSAIJIA-YUSH YENChen, S.-Y.S.-Y.ChenTsai, K.-Y.K.-Y.TsaiNg, H.-T.H.-T.NgFan, C.-H.C.-H.FanPei, T.-H.T.-H.PeiKuan, C.-H.C.-H.KuanChen, Y.-Y.Y.-Y.ChenYen, J.-Y.J.-Y.YenCHIEH-HSIUNG KUANYUNG-YAW CHEN2018-09-102018-09-102009http://www.scopus.com/inward/record.url?eid=2-s2.0-77952062777&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/350098Preliminary design of a two-dimensional electron beam position monitor system for multiple-electron-beam-direct-write lithographyconference paper10.1117/12.8370482-s2.0-77952062777