Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry

Tseng, W. T.W. T.TsengLo, C. H.C. H.LoLee, S. C.S. C.Lee2019-04-292019-04-292001https://scholars.lib.ntu.edu.tw/handle/123456789/406008Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - II. Kinetics and microstructurejournal article10.1149/1.1359201WOS:000168421200026