Diluted low dielectric constant materials as bottom antireflective coating layers for both KrF and ArF lithography

Chen, H.L.H.L.ChenChao, W.C.W.C.ChaoKo, F.H.F.H.KoChu, T.C.T.C.ChuCheng, H.C.H.C.ChengHSUEN-LI CHEN2020-05-122020-05-122002https://scholars.lib.ntu.edu.tw/handle/123456789/491385Diluted low dielectric constant materials as bottom antireflective coating layers for both KrF and ArF lithographyconference paper10.1109/IMNC.2002.11786372-s2.0-84960412870https://www.scopus.com/inward/record.uri?eid=2-s2.0-84960412870&doi=10.1109%2fIMNC.2002.1178637&partnerID=40&md5=883aaea3d0ceb5e5510afd82eb3bf9f7