Nanoscale inhomogeneity and photoacid generation dynamics in extreme ultraviolet resist materials

Wu, P.-J.P.-J.WuWang, Y.-F.Y.-F.WangChen, W.-C.W.-C.ChenWang, C.-W.C.-W.WangCheng, J.J.ChengChang, V.V.ChangChang, C.-Y.C.-Y.ChangLin, J.J.LinCheng, Y.-C.Y.-C.Cheng2019-05-102019-05-102018https://www.scopus.com/inward/record.uri?eid=2-s2.0-85047801895&doi=10.1117%2f12.2316308&partnerID=40&md5=f91fa40082441b62db23b7effe9f7f96https://scholars.lib.ntu.edu.tw/handle/123456789/407273Nanoscale inhomogeneity and photoacid generation dynamics in extreme ultraviolet resist materialsconference paper10.1117/12.23163082-s2.0-85047801895