Self-assembled monolayers of 2-(thienyl)hexylphosphonic acid on native oxide surface of silicon fabricated by air-liquid interface-assisted method

Hsu, Chih-WeiChih-WeiHsuLiou, Huei-RuHuei-RuLiouWEI-FANG SULEE-YIH WANG2008-12-242018-06-282008-12-242018-06-28200800219797http://www.scopus.com/inward/record.url?eid=2-s2.0-49949151853&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/344236http://ntur.lib.ntu.edu.tw/bitstream/246246/93667/1/62.pdfA simple, fast, and low-compound-consuming procedure based on the air-liquid interface-assisted method for preparing self-assembled monolayers (SAMs) of organic molecules with phosphonic acid head groups on the native oxide surface of silicon was demonstrated. The SAMs thus prepared were characterized by contact angle measurement, X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR), and atomic force microscopy (AFM). This approach enabled the fabrication of ordered SAMs in a large-area substrate. © 2008 Elsevier Inc. All rights reserved.application/pdf586655 bytesapplication/pdfPhosphonic acid; Self-assembled monolayer; Silicon oxideSelf-assembled monolayers of 2-(thienyl)hexylphosphonic acid on native oxide surface of silicon fabricated by air-liquid interface-assisted methodjournal article10.1016/j.jcis.2008.04.0372-s2.0-49949151853http://ntur.lib.ntu.edu.tw/bitstream/246246/93667/1/62.pdf