林清富Lin, Ching-Fuh臺灣大學:光電工程學研究所蘇文彥Su, Wen-YanWen-YanSu2010-07-012018-07-052010-07-012018-07-052008U0001-1108200814085500http://ntur.lib.ntu.edu.tw//handle/246246/188396本論文研究主要可分為兩個部分，第一部分為氧化鋅奈米線結構研究，我們利用水熱法生長氧化鋅奈米線，並且藉由雙氧水處理與酸蝕刻來改善氧化鋅奈米線的光電性質。我們採用兩種方式對氧化奈米線做雙氧水處理，第一種是將氧化鋅奈米線浸泡於雙氧水並且75The research in this paper can be separated into two parts. First, the optoelectronic properties of zinc oxide nanowires fabricated by hydrothermal method can be improved by the hydrogen peroxide treatment and the hydrochloric acid (HCl) etching. Zinc oxide (ZnO) nanowires are treated with the hydrogen peroxide (H2O2) solution through two different approaches. The first one is to immerse ZnO nanowires into the H2O2 solution and the samples are heated at 75摘要.................................................... Ibstract ...............................................II錄................................................... IV目錄................................................. VI目錄............................................... VIII1 章 緒論..............................................1 1.1 研究動機...........................................1 1.2 氧化鋅材料簡介.....................................2 1.3 氧化鋅奈米線文獻回顧...............................5 1.3.1 熱蒸鍍法.......................................5 1.3.2 化學氣相沈積法.................................6 1.3.3 分子束磊晶法...................................8 1.3.4 水熱法.........................................9 1.4 氧化鋅電激發光元件................................11 1.4.1 文獻回顧......................................11 1.5 有機發光二極體的結構與操作原理....................13 1.6 有機材料介紹......................................15 1.6.1 PVK(poly(N-vinylcarbazole))簡介...............15 1.6.2 PF(Polyfluorene)簡介..........................15 1.7 論文導覽..........................................162 章 氧化鋅奈米線樣品製作.............................17 2.1 樣品的製作與流程..................................17 2.2.1 基板的清洗....................................17 2.2.2 製備氧化鋅晶種層..............................17 2.2.3 一維氧化鋅奈米線製備..........................18 2.2.4 雙氧水處理....................................18 2.2.5 鹽酸蝕刻......................................19 2.2 分析儀器..........................................20 2.2.1 Photoluminescence(PL)頻譜測量架設.............20 2.2.2 X 光繞射儀(X-ray diffractometry)量測..........21 2.2.3 掃瞄式電子顯微鏡(SEM).........................22 2.2.4 傅立葉轉換紅外線光譜儀(FTIR)..................22 2.2.5 原子力顯微鏡(AFM) ............................22 2.2.6 片電阻量測 (Van der Pauw method) .............233 章 量測結果與討論...................................25 3.1 雙氧水處理對氧化鋅奈米線的影響....................25 3.2 鹽酸蝕刻對氧化鋅奈米線的影響......................32 3.3 結論..............................................394 章 第四章 氧化鋅奈米線電激發光元件..................40 4.1 氧化奈米線電激發光元件的製作與流程................40 4.1.1 鋁電極遮罩的製作..............................40 4.1.2 蝕刻ITO 玻璃..................................40 4.1.3 氧化鋅奈米線的製備............................41 4.1.4 電洞傳輸層溶液的製備..........................41 4.1.5 旋塗電洞傳輸層................................41 4.1.6 鍍鋁..........................................41 4.2 量測結果與討論....................................43 4.2.1 V 曲線量測之架設..............................43 4.2.2 電激發光頻譜量測之架設........................44 4.3 電激發光元件量測結果與討論........................45 4.4 結論..............................................575 章 結論與未來展望...................................58.1 結論................................................58.2 未來展望............................................593667447 bytesapplication/pdfen-US氧化鋅奈米線水熱法雙氧水處理ZnO nanowireshydrothermal methodhydrogen peroxide treatmentthesishttp://ntur.lib.ntu.edu.tw/bitstream/246246/188396/1/ntu-97-R95941061-1.pdf