Use of SiO 2 nanoparticles As etch mask to generate Large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcher

Wang, D.-S.D.-S.WangChao, J.-J.J.-J.ChaoCHING-FUH LIN2018-09-102018-09-102009http://www.scopus.com/inward/record.url?eid=2-s2.0-70449589683&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/350117Use of SiO 2 nanoparticles As etch mask to generate Large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcherconference paper10.1109/CLEOE-EQEC.2009.5196467