Effects of nitrogen partial pressure on titanium oxynitride films deposited by reactive RF magnetron sputtering onto PET substrates

Lin M.C.Chang L.-S.Lin H.C.HSIN-CHIH LIN2019-11-272019-11-27200802578972https://www.scopus.com/inward/record.uri?eid=2-s2.0-50349099253&doi=10.1016%2fj.surfcoat.2008.06.066&partnerID=40&md5=fceb6d0689dc11aafe56908e8ff4b7d9https://scholars.lib.ntu.edu.tw/handle/123456789/432471Effects of nitrogen partial pressure on titanium oxynitride films deposited by reactive RF magnetron sputtering onto PET substratesjournal article10.1016/j.surfcoat.2008.06.0662-s2.0-50349099253