Eliminating the surface inversion layer under the field oxide by low pressure rapid thermal annealing

JENN-GWO HWU2018-09-102018-09-101994http://www.scopus.com/inward/record.url?eid=2-s2.0-0028497229&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/307553Eliminating the surface inversion layer under the field oxide by low pressure rapid thermal annealingjournal article10.1149/1.2055150