Characterization of proximity effects in helium ion beam lithography by direct Monte Carlo simulation and resist calibration

Chien-Lin LeeSheng-Wei ChienKuen-Yu Tsai*KUEN-YU TSAI2019-10-312019-10-312018https://scholars.lib.ntu.edu.tw/handle/123456789/429894Characterization of proximity effects in helium ion beam lithography by direct Monte Carlo simulation and resist calibrationconference paper