葉超雄臺灣大學：應用力學研究所鄭琮達Cheng, Tsung-DarTsung-DarCheng2007-11-292018-06-292007-11-292018-06-292005http://ntur.lib.ntu.edu.tw//handle/246246/62552本文根據過去六年中，全世界各研究團隊對於光場的異常穿透現象與指向性之研究與應用，以及本研究團隊過去三年內對於奈米直寫儀的研究成果，提出具玻璃基材之三維次波長同心圓，而表面為週期性結構光學頭，進行點狀光源光學頭之研製，同時將此一創新技術整合應用於奈米直寫儀，嘗試能在可見光範圍曝光出接近，甚至突破傳統繞射極限的線寬。論文內容包含使用表面電漿理論解釋異常穿透現象及指向性的機制、具有玻璃基材之金屬光學頭的製程、穿透光之遠場光學行為觀察。使用有限元素法(finite element method, FEM)配合嚴格耦合波分析(rigorous coupled wave analysis, RCWA)模擬穿透光之電磁場分布情況，並介紹奈米直寫儀之架構以及系統之校準。 由實驗結果可知，具有基材之三維次波長同心圓表面週期性結構光學頭與獨立金屬薄膜(free-standing metal film)三維次波長同心圓表面週期性結構光學頭，其出射光均同樣具有指向性的效果。並且建立製程基礎。藉由模擬軟體設計，適用於奈米直寫儀光學頭，使其光學特性以及尺寸符合奈米直寫儀所需。在未來工作中，提出使用近場光學顯微鏡(NSOM)以及模擬軟體，以得知出射能量以及光點大小，以利曝光實驗的順利進行。This thesis concentrated its focus on the directionality of the output transmission through a subwavelength annular aperture even though the directionality issue remains active considering the many papers published in the last few years. In the past three years, the NTU Nano-Bio MEMS Group has made many progresses in the Nanowriter project funned by the Material Research Laboratory, Industrial Technology Research Institute, Taiwan. The main target of this thesis is to fabricate an optical head for nanowriter system with a subwavelength annular aperture and periodic annular structure on a glass substrate. This thesis includes using surface plasma theory to explain the mechanism of directionality phenomena, fabrication process of metal films with subwavelength surface structure on a glass substrate, observation of transmission light beam in far field. Both Finite Element Method (FEM) and Rigorous Coupled Wave Analysis (RCWA) were used to simulate electromagnetic filed distribution of transmission light beam from near-field to far field. Finally, the implementation of the above-mentioned technologies of nanowriter system was detailed. The experimental results confirmed that the metal films with subwavelength surface structure on a glass substrate had directionality of output transmission as that of the pure metal film case published previously. In addition, the three-dimensional optical head fabrication processes was developed. By using simulation software and the fabrication processes, the optical head satisified the need of the nanowriter system had been designed successfully, and the output transmission was measured by using an optical microscope. Future works of this thesis are to confirm the output power and the spot size of output beam of optical head by using NSOM and simulation software and to exposure lines with width close to diffraction limit in ambient conditions.謝誌 i 中文摘要 iii Abstract iv 目錄 vi 圖目錄 viii 表目錄 xi 第1章 緒論 1 1.1前言與研究動機 1 1.2文獻回顧與研究方法 3 1.3論文架構概要 6 第2章 原理 7 2.1物理極限與突破契機 7 2.1.1繞射極限 7 2.1.2近場光學及其限制 10 2.1.3新發現的契機 11 2.2異常穿透現象 13 2.2.1電磁波在金屬中的特性 13 2.2.2何謂表面電漿 14 2.2.3激發表面電漿的方式 16 2.2.4異常穿透現象的可能機制 18 2.3指向性傳遞的物理機制 20 第3章 模擬 22 3.1 RCWA介紹 22 3.2有限元素法在電磁模擬的應用 27 3.3模擬與分析 30 3.3.1 FDTD模擬 30 3.3.2有限元素法模擬 33 3.3.3 RCWA模擬 38 第4章 奈米直寫儀之架構與校準 42 4.1奈米直寫儀之光機設計 42 4.1.1系統規格 42 4.1.2系統機構 42 4.2奈米直寫儀之控制系統 46 4.2.1 PID控制 46 4.2.2 XY軸運動控制 49 4.2.3 Z軸控制 51 4.3奈米直寫儀系統校準 53 4.3.1間隙量測方法與架設 53 4.2.3光路校準 54 第5章 實驗結果與分析 57 5.1三維光學頭之製作流程 57 5.2遠場光學定性觀察 62 5.3應用於奈米直寫儀光學頭之設計與製作 66 5.3.1模擬結果 66 5.4 曝光結果與分析 73 5.4.1光阻規格與特性 73 5.4.2曝光結果與討論 76 第6章 結論與未來工作 80 6.1結論 80 6.2未來工作 80 參考資料 845628011 bytesapplication/pdfen-US奈米直寫儀三維次波長表面結構有限元素分析Nanowriter systemThree-dimensional subwavelength surface structuresFinite element analysisthesishttp://ntur.lib.ntu.edu.tw/bitstream/246246/62552/1/ntu-94-R92543011-1.pdf